Surface analysis

X-ray photoelectron spectrometry (XPS)


Surface of solids, incl. films, foils, sheets, powder, pellets, fibers, fabrics, etc.

  • Sample size : > 0.3 mm x 0.7 mm
  • Max. sample size: 30 mm x 60 mm x 19 mm
  • Sampling depth : <~ 10 nm
  • Sensitivity : 0.02 - 0.5 at %



Kratos Axis Supra+

  • X-ray sources: monochromatic Al anode, Al/Mg dual anode tube
  • Sampling area: normal: 300 µm x 700 µm; microspot: 120 µm, 60 µm, 30 µm
  • Chemical State Imaging, max. resolution ca. 2 µm
  • Variable take-off angle
  • Depth profiling with argon ions (for inorganics) or argon cluster ions for low-energy sputtering of organic materials



  • Concentration of elements (except for hydrogen and helium) at the surface
  • Binding states of the elements, oxidation state, binding partners, functional groups
  • Lateral and vertical distribution of these data



  • Quality control for cleaning, activation, functionalization and coatings on surfaces
  • Analysis of failures in adhesive joining, printing, coating, etc.
  • Chemical analysis of coatings, adsorbate layers, surface contaminations, etc.
  • Derivatization (labelling) techniques for the determination of functional groups on polymer surfaces
  • Structural analysis of organic substances (e.g. substitution degree of polymers, composition of peptiden coatings)



Comparative and additional methods

  • Fluorescence labelling (FL)
  • Contact angle goniometry (CAG)
  • Secondary ion mass spectrometry (SIMS)